Abstract:A silicon-on-insulator transistor that is resistant to substrate potential is demonstrated. The 0.18 gIm independently double-gated FlexfetTm transistor with implanted JFET bottom gate shows little change in either threshold voltage or leakage current across a wide range of substrate potentials. Threshold voltage shifts (AVt) and changes in leakage current for both nMOS and pMOS transistors are analyzed for substrate biases ranging from -20 V to +20 V. Results show no more than 20 mV and 10 mV AVt for the nMOS… Show more
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