The concept of quantum nanolaminates (QNL) postulates the decoupling of band gap and refractive index, which in regular dielectric materials is linked. We will show that the quantization effect can be observed in nanolaminate structures of the material combinations Ta2O5-SiO2 and amorphous silicon-SiO2, which were deposited by magnetron sputter deposition. These nanolaminates were characterized by a variety of different methods, which confirmed the layer structure in the nanometer range and the shift of the absorption edge to shorter wavelength. Furthermore, the use of the QNL as the high refractive index material in optical interference coatings was successfully demonstrated in anti-reflection and long pass filter coatings.