“…It has a wide band gap with the value of about 3.7 eV, and can be used for a number of applications in thin film form, such as flat-panel displays [4], gas sensors [5], liquid crystal displays [6], solar cells [7], light-emitting diodes [8] and other optoelectronic devices. Several methods have been employed to deposit these films, like spray pyrolysis [9], magnetron sputtering [10], pulsed laser deposition (PLD) [11], electron beam evaporation [12], sol-gel [13] and metalorganic chemical vapor deposition (MOCVD) [14]. Among these methods, the MOCVD process is suitable for fabrication of thin films due to its easy control of deposition rate and film composition, and relatively large throughput up to commercial volume.…”