With the increase in electronic devices' power density, the thermal runaway caused by thermal aggregation seriously affects the reliability and life of electronic devices. To diffuse the point heat source into the area heat source to reduce the heat aggregation phenomenon, a novel copper encapsulated annealed pyrolytic graphite (APG) was prepared by vacuum hot pressing (VHP). The influence of preparation and plating parameters on the microstructure and thermal conductivity of APG/Cu were studied. As a result, the uniform and compact Ti coating with 0.7 μm thickness was obtained by vacuum evaporation at 800 ℃ for 1.5 h. High thermal conductivity was obtained by the sintering process with graphite content of 50 vol.% at 870 ℃/50 MPa. An ultrahigh in-plane thermal conductivity of 1243.19 W/mK for APG/Cu composites with 50 vol.% graphite content was obtained at 870 ℃/50 MPa. Currently, the density of the composite exceeds 98%. Ultrahigh thermal conductivity makes APG/Cu composites a candidate material for thermal management.