Recently
theorized hybrid II-IV-N2/III-N heterostructures, based
on current commercialized (In,Ga)N devices, are predicted to significantly
advance the design space of highly efficient optoelectronics in the
visible spectrum, yet there are few epitaxial studies of II-IV-N2 materials. In this work, we present heteroepitaxial ZnGeN2 grown on GaN buffers and AlN templates. We demonstrate that
a GaN nucleating surface is crucial for increasing the ZnGeN2 crystallization rate to combat Zn desorption, extending the stoichiometric
growth window from 215 °C on AlN to 500 °C on GaN buffers.
Structural characterization reveals well-crystallized films with threading
dislocations extending from the GaN buffer. These films have a critical
thickness for relaxation of 20–25 nm as determined by reflection
high energy electron diffraction (RHEED) and cross-sectional scanning
electron microscopy (SEM). The films exhibit a cation-disordered wurtzite
structure, with lattice constants a = 3.216 ±
0.004 Å and c = 5.215 ± 0.005 Å determined
by RHEED and X-ray diffraction (XRD). This work demonstrates a significant
step toward the development of hybrid ZnGeN2-GaN integrated
devices.