A review of reactive ion beam etching for production

Revell, P.J.; Goldspink, G.F.

doi:10.1016/0042-207x(84)90083-6

Cited by 17 publications

(6 citation statements)

References 45 publications

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“…The pattern transfer of the resist profile into the fused silica substrate was performed by RIBE. 34,35 An advantage of RIBE is the large range of selectivities (etch rate of substrate material related to etch rate of mask material) that can be realized by varying the mixture of the reactive gases. The selectivity can be varied over several orders of magnitude making it possible to compress or stretch surface profiles during the pattern transfer.…”

Section: Methodsmentioning

confidence: 99%

Reactive ion beam etching of highly dispersive, high-efficiency transmission gratings for the VIS range

et al. 2019

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Reflection losses due to refractive index mismatch limit the obtainable diffraction efficiencies for transmission gratings in the highly dispersive regime, i.e., with period to wavelength ratios smaller than 0.7. The design and fabrication of such gratings with high-diffraction efficiencies (≥94%, Littrow configuration) will be discussed with an emphasis on process strategies to control the profiles in the reactive ion beam etching step. Experimental results from the manufacturing of monolithic fused silica pulse compression gratings with 3000 L∕mm optimized for a center wavelength of 519 nm will be presented. The influence of different etching parameters such as etch gas mixture, ion incidence angle, and acceleration voltage of the ion source on profile depth, side-wall angle, duty cycle, and ultimately diffraction efficiencies will be discussed.

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Section: Methodsmentioning

confidence: 99%

Reactive ion beam etching of highly dispersive, high-efficiency transmission gratings for the VIS range

et al. 2019

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“…Gas-phase reactive ion etching (RIE) technology is a highly anisotropic etching technology for micro-/nanofabrication . According to the properties of the etched object, the reactive plasmas used can be charged particles, excited neutrals, or radicals. For example, RIE using a mixture of O 2 and CHF 3 has been used to etch silica NPs to obtain the desired nanostructures .…”

Section: Introductionmentioning

confidence: 99%

Semishell Janus Nanoparticle-Enabled pH-Responsive Rod-Shaped Assembly for Photothermal Therapy

García

et al. 2021

ACS Appl. Nano Mater.

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The controllable aggregation of nanoparticles in solution is an important but unsolved problem in nanotechnology, which is mainly hindered by the symmetrical structure of the nanoparticles. Here, we propose an anisotropic semishell nanostructure to achieve the rod-shaped assembly of nanoparticles in solution. The isotropic Au@silica core–shell nanoparticles are self-assembled on the silicon wafer by the drop-casting technique to form a monolayer film. Au@silica semishell nanoparticles are obtained after selectively removing part of the silica shell by reactive ion etching. After functionalization with pH-sensitive 4-mercaptobenzoic acid molecules, the semishell nanoparticles display pH-responsive localized surface plasmon resonance coupling and near-infrared light absorption, thereby holding great potential for noninvasive photothermal therapy.

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“…Ion milling utilizing noble gas ions can be used for etching materials which cannot easily be etched chemically [5]. Laser ablation [6,7], which is also used for producing distinct * Tel.…”

Section: Introductionmentioning

confidence: 99%

Deep plasma etching of glass with a silicon shadow mask

Kolari

2008

Sensors and Actuators A: Physical

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A review of reactive ion beam etching for production

Cited by 17 publications

References 45 publications

Reactive ion beam etching of highly dispersive, high-efficiency transmission gratings for the VIS range

Reactive ion beam etching of highly dispersive, high-efficiency transmission gratings for the VIS range

Semishell Janus Nanoparticle-Enabled pH-Responsive Rod-Shaped Assembly for Photothermal Therapy

Deep plasma etching of glass with a silicon shadow mask

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