2024
DOI: 10.3390/plasma7030029
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A Review of Experimental Investigations into the Time Evolution of Low-Pressure Capacitively Coupled Plasmas in Their Early Stages of Development

Pietro Mandracci

Abstract: Capacitively coupled plasma (CCP) discharges working at low pressure are widely used for the synthesis of thin films and the modification of the surface properties of materials. Due to their importance, considerable research was carried out over the years to understand their working mechanisms, and the physical properties of the CCP discharges were measured by many research groups, while simulations of their characteristics were often performed using both fluid and kinematic models. However, most of the simula… Show more

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