A Review of Alkali Tungsten Bronze Nanoparticles for Applications in Plasmonics

Tegg, Levi; Keast, V. J.

doi:10.1007/s11468-022-01749-x

Cited by 5 publications

(1 citation statement)

References 222 publications

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“…Au and Ag, due to their high cost and incompatibility with microelectronic industry fabrication [30,31]. This has prompted extensive research toward alternative plasmonic materials, including heavily doped transparent conductive oxides [32][33][34], non-stoichiometric oxides [35,36], alkalinoble intermetallics [37,38], and the already mentioned TMNs [14-16, 39, 40]. In particular, the combination of critical features of TMNs, such as optical tunability, ease of fabrication and refractory nature, suggests a considerable potential of this material class in the field of plasmonics [41,42].…”

Section: Introductionmentioning

confidence: 99%

Plasmonic titanium nitride nanomaterials prepared by physical vapor deposition methods

Mascaretti,

Mancarella,

Afshar

et al. 2023

Nanotechnology

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Titanium nitride (TiN) has recently emerged as an alternative to coinage metals to allow large-scale development of plasmonic applications. In this regard, its optical performance can be conveniently tuned by tailoring the process parameters of physical vapor deposition methods, such as magnetron sputtering and pulsed laser deposition. This review first introduces the fundamental features of TiN and a description on its optical properties, including insights on the main experimental techniques to measure them. Afterwards, magnetron sputtering and pulsed laser deposition are selected as fabrication techniques for TiN nanomaterials. The fundamental mechanistic aspects of both techniques are discussed in parallel with selected case studies from the recent literature, which elucidate the critical advantages of such techniques to engineer the nanostructure and the plasmonic performance of TiN.

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