2003
DOI: 10.1016/s0895-7177(03)90013-6
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A reduced-basis discretization method for chemical vapor deposition reactor simulation

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Cited by 13 publications
(7 citation statements)
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“…A common value used in transport-reaction processes dynamics area is σ 0.1. The condition of small σ in Assumption 2 is satisfied by the majority of transport-reaction processes [1,20,44,47,62]. The small value for σ is not generally satisfied for 1.…”
Section: Model Order Reduction Via Galerkin's Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…A common value used in transport-reaction processes dynamics area is σ 0.1. The condition of small σ in Assumption 2 is satisfied by the majority of transport-reaction processes [1,20,44,47,62]. The small value for σ is not generally satisfied for 1.…”
Section: Model Order Reduction Via Galerkin's Methodsmentioning
confidence: 99%
“…Recently there has been an increasing focus on modeling and control of distributed parameter systems (DPSs) in chemical process and advanced material production industries. Such type of systems frequently arise in a wide range of chemical processes, e.g., fixed and fluidized bed reactors, polymerization and crystallization processes, chemical vapor deposition systems and semiconductor manufacturing processes, due to the existence of diffusion, dispersion and convection mechanisms [1,21,44,53,62]. It is imperative to tightly control these processes so that there are zero product quality excursions, even when the process objectives dynamically change which is a usual occurrence in such industrial applications.…”
Section: Introductionmentioning
confidence: 99%
“… for heating rod and catalytic packed‐bed reactor examples, Refs . for chemical vapor deposition process and Ref . for plasma discharge reactor).…”
Section: Mathematical Preliminariesmentioning
confidence: 99%
“…Important processes in chemical and advanced material industry often couple complex transport phenomena with chemical reactions, such as reactive distillation in petrochemical industry, lithographic processes in semiconductor manufacturing, chemical vapor deposition processes, plasma discharge reactors, and tin float bath process in glass production [1,18,39,61]. In recent years, research in the field of process control has focused on the synthesis of control structures for these transport-reaction processes.…”
Section: Introductionmentioning
confidence: 99%
“…In recent years, research in the field of process control has focused on the synthesis of control structures for these transport-reaction processes. The spatially distributed and nonlinear nature of the associated system dynamics make the control problem nontrivial [1,15,18,38,44,52,53,58]. The significant diffusion transport of the species leads to a mathematical description of dissipative partial differential equations (PDEs) whose long term and dominant behavior can be represented by finite number of the process spatial profiles [56] because the characteristic spectrum of the spatial differential operator of such PDEs can be decomposed to a finite-dimensional slow and an infinite-dimensional fast and stable parts [18].…”
Section: Introductionmentioning
confidence: 99%