A random generation approach to pattern library creation for full chip lithographic simulation

Zou, Elain; Hong, Sid; Liu, Limei; Huang, Lucas; Yang, Legender; Kabeel, Aliaa; Madkour, Kareem; ElManhawy, Wael; Kwan, J.W.; Du, Chunshan; Hu, Xinyi; Wan, Qijian; Zhang, Recoo

doi:10.1117/12.2258133

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Hotspot Detection In the Verification Stages Of The Physical Design1

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2022

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“…The monitor points for inspection and finds sensitive design structures that are produced by analyzing statistical design data [60] . A scoring system is utilized to categorize randomly generated patterns and filters out the yield of problematic patterns [61] . Lastly, the LFD check is a necessary verification before a tape-out at the 14 nm technology node and beyond.…”

Section: Hotspot Detection In the Verification Stages Of The Physical Designmentioning

confidence: 99%

Advanced process and electron device technology

Zhang¹,

Su²,

Chang³

et al. 2022

Tsinghua Sci. Technol.

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This article reviews advanced process and electron device technology of integrated circuits, including recent featuring progress and potential solutions for future development. In 5 years, for pushing the performance of fin field-effect transistors (FinFET) to its limitations, several processes and device boosters are provided. Then, the three-dimensional (3D) integration schemes with alternative materials and device architectures will pave paths for future technology evolution. Finally, it could be concluded that Moore's law will undoubtedly continue in the next 15 years.

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Section: Hotspot Detection In the Verification Stages Of The Physical Designmentioning

confidence: 99%