Abstract:Abstract. Strained silicon field effect transistor (FET) has been known for enhancing carrier mobility. The stained Si channel thickness, the Si 1-x Ge x composition fraction and the Si 1-x Ge x layer thickness are three crucial parameters for designing strained Si/SiGe MOSFET. Mobility enhancement and device reliability may be unnecessarily conservative. In this paper, numerical investigation of drain current, gate leakage and threshold voltage for strained Si/SiGe MOSFET are simulated under different device … Show more
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