A Programmable Nanofabrication Method for Complex 3D Meta-Atom Array Based on Focused-Ion-Beam Stress-Induced Deformation Effect

Chen, Xiaoyu; Xia, Yuyu; Mao, Yifei; Huang, Yun; Zhu, Jia; Xu, Jingyi; Zhu, Rui; Shi, Lei; Wu, Wengang

doi:10.3390/mi11010095

Cited by 4 publications

(5 citation statements)

References 44 publications

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“…A recently developed employment of FIB milling for 3D nanofabrication exploits mechanical effects caused by the collision of the ion beam on the substrate surface, such as bending, folding, or stress-induced deformations. By a proper control of the ion dose and the irradiated area, periodic complex 3D micro/nanostructures, even with chiral features [ 102 , 103 ], can be manufactured. The concept is based on transforming an unfolded 2D pattern into a 3D micro/nano system, and it is suitable for various metals and dielectric thin films.…”

Section: 3d Chiral Nanostructures Realized By Fib Processingmentioning

confidence: 99%

“…Moreover, by controlling the irradiation dose, the damaging of the material can be controlled. FIB stress induced deformation (FIB-SID), to create arrays of 3D meta-atoms on a suspended gold thin film, were optically and mechanically studied in [ 102 ]. The reflectance spectra of the 3D meta-atoms have shown polarization dependence, when interacting with linearly polarized light, with spectral peaks located within the range of mid-wave IR and long-wave IR.…”

Section: 3d Chiral Nanostructures Realized By Fib Processingmentioning

confidence: 99%

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Focused Ion Beam Processing for 3D Chiral Photonics Nanostructures

et al. 2020

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The focused ion beam (FIB) is a powerful piece of technology which has enabled scientific and technological advances in the realization and study of micro- and nano-systems in many research areas, such as nanotechnology, material science, and the microelectronic industry. Recently, its applications have been extended to the photonics field, owing to the possibility of developing systems with complex shapes, including 3D chiral shapes. Indeed, micro-/nano-structured elements with precise geometrical features at the nanoscale can be realized by FIB processing, with sizes that can be tailored in order to tune optical responses over a broad spectral region. In this review, we give an overview of recent efforts in this field which have involved FIB processing as a nanofabrication tool for photonics applications. In particular, we focus on FIB-induced deposition and FIB milling, employed to build 3D nanostructures and metasurfaces exhibiting intrinsic chirality. We describe the fabrication strategies present in the literature and the chiro-optical behavior of the developed structures. The achieved results pave the way for the creation of novel and advanced nanophotonic devices for many fields of application, ranging from polarization control to integration in photonic circuits to subwavelength imaging.

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Section: 3d Chiral Nanostructures Realized By Fib Processingmentioning

confidence: 99%

Section: 3d Chiral Nanostructures Realized By Fib Processingmentioning

confidence: 99%

Focused Ion Beam Processing for 3D Chiral Photonics Nanostructures

et al. 2020

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“…[12] The methods to achieve the desired out-of-plane transformation (i.e., bend, fold, roll and buckle) include micro drop-guided interaction, [20] electron irradiation, [21] and ion irradiations. [15,22] As with the preceding cutting step, the Ga-FIB is commonly used for irradiation and offers great flexibility in terms of beam dose and energy. When the ion beam irradiation is limited to narrow bands (i.e., linedoses), sharp out-of-plane localized folding of the membrane is the result.…”

Section: Introductionmentioning

confidence: 99%

“…[11] Since the cutting of 2D patterns into a membrane at the nanoscale is well-established in recent years, nano-kirigami has offered new opportunities to explore the applications for 3D optical devices. [11,12] The 3D nano-kirigami and origami structures have promising optical and photonic functionality in giant optical chirality, [13] metasurfaces, [3,14,15] and plasmonics. [16] Commonly, the 2D substrates which are patterned for nanokirigami and origami are metal (e.g., Au), dielectric (e.g., Si 3 N 4 ), or bilayer (e.g Au on Si 3 N 4 ).…”

mentioning

confidence: 99%

Nano‐Kirigami Structures and Branched Nanowires Fabricated by Focused Ion Beam‐Induced Milling, Bending, and Deposition

Xia

Notte

2022

Adv Materials Inter

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stress or external forces. The external forces could include capillary force, [6] mechanical force, [7] thermal effects, [8] etc. Additionally, there are methods for the fabrication of 3D functional micro and nanostructures: gas-assisted focused electron beam-induced deposition (FEBID) and focused ion beam-induced deposition (FIBID), both of which use volatile organic and organometallic precursors. [9] Both FEBID and FIBID processes enable the direct-write fabrication of complex 3D nanostructures with feature dimensions below 50 nm, resulting in pore-free, nanometer-smooth high-fidelity structures with increasing choice of deposited materials via novel precursors. FEBID has recently evolved from a trial-anderror laboratory method to a predictable 3D nano-printing technology with unique advantages. [10] Kirigami, the art of cutting and folding a membrane to create versatile shapes, is an example of a transformational process allowing the creation of 3D structures from a 2D membrane. [11] Since the cutting of 2D patterns into a membrane at the nanoscale is well-established in recent years, nano-kirigami has offered new opportunities to explore the applications for 3D optical devices. [11,12] The 3D nano-kirigami and origami structures have promising optical and photonic functionality in giant optical chirality, [13] metasurfaces, [3,14,15] and plasmonics. [16] Commonly, the 2D substrates which are patterned for nanokirigami and origami are metal (e.g., Au), dielectric (e.g., Si 3 N 4 ), or bilayer (e.g Au on Si 3 N 4 ). Typically, these films are less than 100 nm thick and are free-standing, that is, not directly supported by a substrate. The techniques for introducing the precise cuts into these substrates include e-beam method [3,17] and focus ion beam (FIB) milling. [13,14,16] Recent e-beam lithography methods involve photoresist deposition, e-beam exposure, thin film deposition, etching, and removal of photoresist. With e-beam patterning methods, various resist nano-kirigami structures and multiscale metallic patterns can be fabricated with enhanced efficiency and precision to provide more choices of patterning solution for broader applications. [18,19] In contrast, FIB milling is more widely used because it allows for simple and direct writing (cutting) of the patterns on the 2D material. Because of their widespread commercial availability, the gallium FIB (Ga-FIB) is the routine FIB instrument for these 3D nanostructures hold the key to building custom devices with special and flexible functionalities. Ion beam-induced bending and folding are used for the fabrication of 3D nanostructures from prepared 2D nano-patterned membranes. Tensile and compressive stresses can be introduced within the layers of a thin membrane under ion beam irradiation to manipulate and control the formation of nano-kirigamis. Both localized and broader ion beam irradiation can be used to induce bending in the membrane with remarkable control of the bending angle and direction. In this work, an approach to fabricate nano-kirigamis with...

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“…As a result, FIB‐SID, with its ability to go from simple planar design to highly sophisticated volumetric structures by folding, holds great promise. This process has been used for the fabrication of many nanosystems, from simple folded beam structures, [ 21–23 ] carbon nanotubes, [ 24 ] and semiconductor nanowires [ 25 ] to origami cubes, [ 26,27 ] helix, [ 20 ] metamaterials, [ 28–30 ] and kirigami devices. [ 31–33 ] To the best of our knowledge, Mao et al.…”

Section: Introductionmentioning

confidence: 99%

NanoRobotic Structures with Embedded Actuation via Ion Induced Folding

et al. 2021

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4D structures are tridimensional structures with time‐varying abilities that provide high versatility, sophisticated designs, and a broad spectrum of actuation and sensing possibilities. The downsizing of these structures below 100 μm opens up exceptional opportunities for many disciplines, including photonics, acoustics, medicine, and nanorobotics. However, it requires a paradigm shift in manufacturing methods, especially for dynamic structures. A novel fabrication method based on ion‐induced folding of planar multilayer structures embedding their actuation is proposed—the planar structures are fabricated in bulk through batch microfabrication techniques. Programmable and accurate bidirectional foldings (−70° − +90°) of Silica/Chromium/Aluminium (SiO2/Cr/Al) multilayer structures are modeled, experimentally demonstrated then applied to embedded electrothermal actuation of controllable and dynamic 4D nanorobotic structures. The method is used to produce high‐performances case‐study grippers for nanorobotic applications in confined environments. Once folded, a gripping task at the nano‐scale is demonstrated. The proposed fabrication method is suitable for creating small‐scale 4D systems for nanorobotics, medical devices, and tunable metamaterials, where rapid folding and enhanced dynamic control are required.

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A Programmable Nanofabrication Method for Complex 3D Meta-Atom Array Based on Focused-Ion-Beam Stress-Induced Deformation Effect

Cited by 4 publications

References 44 publications

Focused Ion Beam Processing for 3D Chiral Photonics Nanostructures

Focused Ion Beam Processing for 3D Chiral Photonics Nanostructures

Nano‐Kirigami Structures and Branched Nanowires Fabricated by Focused Ion Beam‐Induced Milling, Bending, and Deposition

NanoRobotic Structures with Embedded Actuation via Ion Induced Folding

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