A process and geometry driven device macro model for statistical simulation of bipolar ICs

Current design automation trends and methodologies are consistently improving productivity, quality, and first time success. However, these trends are directed toward digital MOS and BICMOS and not Bipolar analog/digital.Historically Bipolar analog/digital design has been neglected in the field of Design Automation because of complexity, lack of priority and cost. Recognizing the significant demand for improvements in Bipolar standard cell and semi custom analog/digital design, an integrated design environment that enables improved productivity, quality and first time success is presented.

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An integrated geometric driven bipolar analog/digital standard cell and semi custom design environment

Rencher

Cung

Kasel

et al.

Third Annual IEEE Proceedings on ASIC Seminar and Exhibit

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A process and geometry driven device macro model for statistical simulation of bipolar ICs

Cited by 1 publication

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An integrated geometric driven bipolar analog/digital standard cell and semi custom design environment

An integrated geometric driven bipolar analog/digital standard cell and semi custom design environment

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