2012
DOI: 10.1002/adma.201104171
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A Polyferroplatinyne Precursor for the Rapid Fabrication of L10‐FePt‐type Bit Patterned Media by Nanoimprint Lithography

Abstract: A polyferroplatinyne polymer can be patterned on the surface of Si wafer in ordered nanoline or nanodot shapes with PDMS molds through nanoimprint lithography (NIL), and subsequent thermal treatment gives rise to the nanopatterned arrays of L1(0) -FePt nanoparticles with the same periodicities. The method offers excellent potential to be utilized in the simple and rapid fabrication of bit patterned media for magnetic data recording.

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Cited by 138 publications
(95 citation statements)
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“…As the critical MO component in hybrid materials, iron platinum (FePt) NPs are of great interest due to their excellent chemical stability and demonstrated applications in high-density magnetic storage, bio-sensing and therapeutics [74][75][76][77]. Simultaneous synthesis and surface modification of size controlled FePt particles with diameter less than 10 nm allowed the construction of paramagnetic materials displaying unique size dependent properties [78][79][80][81].…”
Section: Introductionmentioning
confidence: 99%
“…As the critical MO component in hybrid materials, iron platinum (FePt) NPs are of great interest due to their excellent chemical stability and demonstrated applications in high-density magnetic storage, bio-sensing and therapeutics [74][75][76][77]. Simultaneous synthesis and surface modification of size controlled FePt particles with diameter less than 10 nm allowed the construction of paramagnetic materials displaying unique size dependent properties [78][79][80][81].…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, as demonstrated by Hitachi Global Storage Technologies (HGST), BPM will be improved towards higher areal density by utilizing nanolithography to break magnetic media down into small regions or bit "islands" on a platter's surface. 3 Recently, the main preparation methods of BPM include electron-beam lithography (EBL), 4 directed self-assembly of block copolymer, [5][6][7][8] self-aligned double patterning 9 and nanoimprint lithography (NIL), 8,[10][11][12][13] etc. Among these, NIL allows the fabrication of large-area nanometer scale patterns rapidly as BPM possesses good features such as low production cost, high throughput and high resolution.…”
Section: Introductionmentioning
confidence: 99%
“…[38][39][40] We have previously reported a series of Fe,Pt-containing metallopolymers as precursors to prepare L10-FePt NPs by the one-pot pyrolysis under an inert atmosphere. 10,41,42 These single-source polymer precursors could also be used as photoresist to afford micro-or nano-patterns by EBL or NIL. 43,44 However, the coercivities of the as-synthesized FePt NPs are still relatively low, which would restrict their potential for magnetic data recording media.…”
Section: Introductionmentioning
confidence: 99%
“…5 As an alternative to photolithography processes to obtain various nanostructures, ultraviolet curing nanoimprint lithography has been proposed and pursued in creating nanostructures. [6][7][8][9][10][11] Ultraviolet curing nanoimprint lithography has existed for several years and has demonstrated great potential for advanced electronic nanofabrication endeavors in the industrial production of many semiconductors, hard disk drive storage devices, light-emitting diodes, solar cell devices, actuators, biosensors, and microelectro mechanical systems. Ultraviolet curing nanoimprint lithography to yield optical structures is being pursued in optics and photonics to yield low-cost optical components.…”
Section: Introductionmentioning
confidence: 99%