A plasma source for high power microwave interaction studies

Rathod, Priyavandana J.; Bahl, R.; Raval, Jayesh; Saxena, Y. C.; Shyam, A.; Das, Amita; Kaw, P. K.

doi:10.1109/plasma.2011.5993096

2011 Abstracts IEEE International Conference on Plasma Science 2011

DOI: 10.1109/plasma.2011.5993096

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A plasma source for high power microwave interaction studies

Priyavandana J. Rathod

R. Bahl

Jayesh Raval

et al.

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A plasma source for high power microwave interaction studies

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