2003
DOI: 10.1016/s0026-2714(02)00282-2
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A physical approach on SCOBIC investigation in VLSI

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Cited by 7 publications
(3 citation statements)
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“…Several techniques have been developed to localize electrical failures in LSI circuits, such as thermal or infrared emission analysis, laser testing techniques, emission microscopy, and electron beam testing. In particular, laser-testing techniques, such as the infrared-optical beam induced resistance change [4] and optical beam induced current (OBIC) [5], offer alternatives for non-contact, non-destructive failure analysis.…”
Section: Introductionmentioning
confidence: 99%
“…Several techniques have been developed to localize electrical failures in LSI circuits, such as thermal or infrared emission analysis, laser testing techniques, emission microscopy, and electron beam testing. In particular, laser-testing techniques, such as the infrared-optical beam induced resistance change [4] and optical beam induced current (OBIC) [5], offer alternatives for non-contact, non-destructive failure analysis.…”
Section: Introductionmentioning
confidence: 99%
“…Several methods for realizing a noncontact IC probe have been proposed. [1][2][3] One method is to detect the electromagnetic radiation in the terahertz range emitted when a femtosecond pulsed laser is applied to the semiconductor. 4) Another method is to measure the electric field close to the IC surface using a crystal whose index of refraction depends on the field.…”
mentioning
confidence: 99%
“…The inspection and failure analysis of semiconductor devices has become a critical issue as there is an increasing demand for quality and reliability in circuits [1][2][3][4]. In the field of LSI failure analysis, techniques such as emission microscopy, infrared optical beam induced resistance change (IR-OBIRCH) and electron beam testing are used to localize the electrical failure spot nondestructively.…”
mentioning
confidence: 99%