2018
DOI: 10.1007/s10854-018-0135-5
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A photoelectron study of annealing induced changes to workfunction and majority carrier type in pulsed laser deposited few layer WS2 films

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Cited by 7 publications
(2 citation statements)
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“…Using a base pressure of 10 −6 Torr and 1 cm 2 polished quartz substrates, few-layered WS 2 films were grown by PLD via ablation of a polycrystalline WS 2 target (Kurt J. Lesker) using the 248 nm KrF line of an excimer laser (Lambda Physik) with 25 ns pulses. 20 Low, moderate, and high laser fluencies of 0.35, 0.75, and 1.5 J/cm 2 , respectively, and laser frequencies of 1, 5, and 10 Hz were studied. We used a relatively low substrate temperature of 400 °C because of our interest in flexible substrates and expectation that the processing developed here can be transferred to such substrates.…”
Section: Methodsmentioning
confidence: 99%
“…Using a base pressure of 10 −6 Torr and 1 cm 2 polished quartz substrates, few-layered WS 2 films were grown by PLD via ablation of a polycrystalline WS 2 target (Kurt J. Lesker) using the 248 nm KrF line of an excimer laser (Lambda Physik) with 25 ns pulses. 20 Low, moderate, and high laser fluencies of 0.35, 0.75, and 1.5 J/cm 2 , respectively, and laser frequencies of 1, 5, and 10 Hz were studied. We used a relatively low substrate temperature of 400 °C because of our interest in flexible substrates and expectation that the processing developed here can be transferred to such substrates.…”
Section: Methodsmentioning
confidence: 99%
“…The switch from n to p-type was accompanied by an increase in workfunction from 3.6 eV to 4.52 eV as determined by UPS. The details of these studies have been reported 6 .…”
Section: Intrinsic P-typementioning
confidence: 99%