A phase segregating polymer blend for 2xnm feature applications

Abstract

A phase segregating polymer blend comprising a SOD precursor polysilazane and an organic polymer PSαMS [poly(styrene-co-α-methyl styrene)] was studied. By utilizing similar approaches employed in DSA (directed self-assembly) such as patterned substrates, surface chemical modification etc and their combination, we achieved 2xnm spacer and airgap-like structure. Vertical phase separation and cylinder microdomains in the film of this blend can be straightforwardly observed by cross-section SEM (Scanning Electron Microscope) respectively. The airgap-like structure derived from cylinder microdomains was directly obtained on ArF resist pattern. Spacer derived from vertical phase separation was obtained on pretreated ArF resist pattern.