A novel water developable tetraphenyltin-based nonchemically-amplified molecular resist for sub-13 nm lithography

Wang, Zhihao; Chen, Jinping; Yu, Tianjun; Zeng, Yi; Guo, Xudong; Wang, Shuangqing; Hu, Rui; Tian, Peng; Vockenhuber, Michaela; Kazazis, Dimitrios; Ekinci, Yasin; Yang, Guoqiang; Li, Yi

doi:10.1039/d3lf00254c

RSC Appl. Interfaces

2024

DOI: 10.1039/d3lf00254c

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A novel water developable tetraphenyltin-based nonchemically-amplified molecular resist for sub-13 nm lithography

Zhihao Wang,

Jinping Chen,

Tianjun Yu

et al.

Abstract: A single-component nonchemically-amplified resist (n-CARs) based tetraphenyltin derivative (SnMSF4) was developed for electron beam and extreme ultraviolet lithography. The structure of SnMSF4 was characterized by 1H NMR, 19F NMR, HRMS,...

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A novel water developable tetraphenyltin-based nonchemically-amplified molecular resist for sub-13 nm lithography

Abstract: A single-component nonchemically-amplified resist (n-CARs) based tetraphenyltin derivative (SnMSF4) was developed for electron beam and extreme ultraviolet lithography. The structure of SnMSF4 was characterized by 1H NMR, 19F NMR, HRMS,...

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References 41 publications

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