2020
DOI: 10.1016/j.corsci.2020.108441
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A novel TiO2 nanotube arrays/MgTixOy multiphase-heterojunction film with high efficiency for photoelectrochemical cathodic protection

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Cited by 55 publications
(15 citation statements)
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“…Therefore, the position of E F can be determined by measuring the WF. Generally, the surface potential of the electrode can be obtained through the SKP test, and the relationship between surface potential and WF is as follows: , where WF­(sample) is the WF of the photoelectrode, WF­(tungsten) is the surface potential (4.55 eV) relative to the tungsten reference electrode, and Δ W (photoelectrode) is the surface potential of the photoelectrode tested using the SKP. The surface potential of the semiconductor material can be obtained through the SKP test; therefore, the WF­(sample) can be calculated by formula 3.…”
Section: Resultsmentioning
confidence: 89%
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“…Therefore, the position of E F can be determined by measuring the WF. Generally, the surface potential of the electrode can be obtained through the SKP test, and the relationship between surface potential and WF is as follows: , where WF­(sample) is the WF of the photoelectrode, WF­(tungsten) is the surface potential (4.55 eV) relative to the tungsten reference electrode, and Δ W (photoelectrode) is the surface potential of the photoelectrode tested using the SKP. The surface potential of the semiconductor material can be obtained through the SKP test; therefore, the WF­(sample) can be calculated by formula 3.…”
Section: Resultsmentioning
confidence: 89%
“…Therefore, the position of E F can be determined by measuring the WF. Generally, the surface potential of the electrode can be obtained through the SKP test, and the relationship between surface potential and WF is as follows: 41,42 = + W WF(sample) WF(tungsten) (photoelectrode) 1000…”
Section: Resultsmentioning
confidence: 99%
“…The CdIn 2 S 4 /WO 3 composite layer has the lowest the average surface potential of approximately −155 mV. A lower surface potential represents a smaller surface work function, and the smaller the work function, the easier the electrons escape from the photoelectrode and flow to the coupled metal to achieve CP effect [9,27] . The work function of a photoelectrode can be calculated by Formula : [28] trueWFS=WFT+ΔWS/1000 …”
Section: Resultsmentioning
confidence: 99%
“…Photo‐electrochemical CP technology, as a promising metallic corrosion protection method by using solar energy to generate photoinduced electrons to cathodically protect its coupled metals, meets the concept of green environmental protection and sustainable development, and thus has been widely concerned [3] . It was reported that SrTiO 3 /TiO 2 , [4] Ag 2 S/TiO 2 , [5] Co 3 O 4 /ZnO, [6] g‐C 3 N 4 /ZnO, [7] g‐C 3 N 4 /In 2 O 3 , [8] TiO 2 /MgTi x O y [9] have good photo‐electrochemical CP performance under light illumination. However, these photoelectrodes can only realize CP under light illumination, and cannot provide continuous protection after switching off the light, which limits their practical application.…”
Section: Introductionmentioning
confidence: 99%
“…Recently, graphitic carbon nitride (g-CN) is consider as a promising PEC cathodic protection material in the field of PEC anticorrosion. Achieving a long-term protection, especially for metals with a relatively more negative self-corrosion potential (carbon steel: ∼−0.65 V vs Ag/AgCl), is a major problem in this filed. The working mechanism of PEC cathodic protection is using photogenerated electrons directly to provide protection for metals. Moreover, only a small number of electrons is required [open circuit potential (OCPT) is lower than the self-corrosion potential of the metal] in PEC protection for metals. , The PEC anticorrosion system can facilitate the accumulation of electrons and enables the evaluation of the ISES system exactly.…”
Section: Introductionmentioning
confidence: 99%