2007
DOI: 10.1016/j.scriptamat.2007.06.017
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A novel synthesis method for large area metallic amorphous/nanocrystal films by the glow-discharge plasma technique

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Cited by 30 publications
(17 citation statements)
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“…As is well known, the grain size dependence of hardness for polycrystalline metals can be described by the classical Hall-Petch relationship. The hardness value changes from 15 GPa for the β-Ta film with a grain size of 32.3 nm [25] to [16][17][18][19][20][21][22][23] GPa for the β-Ta films with grain sizes in range of 5−15 nm [26]. According to the Archard's theory [27], the wear resistance is proportional to the hardness of Figure 4a shows the representative load-displacement (P-h) curves of the β-Ta coating and uncoated Ti-6Al-4V measured using a nanoindentation tester equipped with a Berkovich indentor under a maximum load of 20 mN.…”
Section: Crystalline Structure and Microstructure Of Ta Coatingmentioning
confidence: 99%
“…As is well known, the grain size dependence of hardness for polycrystalline metals can be described by the classical Hall-Petch relationship. The hardness value changes from 15 GPa for the β-Ta film with a grain size of 32.3 nm [25] to [16][17][18][19][20][21][22][23] GPa for the β-Ta films with grain sizes in range of 5−15 nm [26]. According to the Archard's theory [27], the wear resistance is proportional to the hardness of Figure 4a shows the representative load-displacement (P-h) curves of the β-Ta coating and uncoated Ti-6Al-4V measured using a nanoindentation tester equipped with a Berkovich indentor under a maximum load of 20 mN.…”
Section: Crystalline Structure and Microstructure Of Ta Coatingmentioning
confidence: 99%
“…The polished substrates were then rinsed in ethanol using an ultrasonic washer. In the process of double-cathode glow discharge, one cathode serves as the target composed of the desired sputtering materials, and the other as the substrate material, as described elsewhere [16,17]. When two different voltages are applied to the two cathodes, glow discharge occurs.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…Before sputter deposition, the substrate surfaces were ground to a surface finish of Ra ¼ 0.2 mm, and rinsed with ethanol followed by acetone. The nanocrystalline (Mo x Cr 1Àx ) 5 Si 3 films were deposited onto 316L SS substrates by a double cathode glow discharge apparatus which was described in our previous papers [6]. In the process of double-cathode glow discharge, one cathode is fabricated as source (target) by desired sputtering materials, and the other cathode is as substrate materials.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…Furthermore, several studies have been reported that corrosion resistance of nanocrystalline materials is superior to their conventional coarse-grained counterparts with the same composition. In our previous work [6,7], we have found that the double-cathode glow discharge technique can be used to synthesize nanocrystalline Al 2 Mg film and nanocrystalline Cr 3 Si film with a grain size of <5 nm on magnesium alloy and Titanium alloy, respectively. The main purpose of the present work is to study the effect of substitution of Cr for Mo on the corrosion resistance of nanocrystalline (Mo x Cr 1Àx ) 5 Si 3 film and properties of the passive film formed in NaCl solution.…”
Section: Introductionmentioning
confidence: 99%