A novel pulse-poling technique for EO polymer waveguide devices using device electrode poling

Investigation of Polymer Optical Waveguide Devices

“…There are several methods that have been employed for fabricating NLO polymer devices. The two most common techniques, namely photobleach [4,8,21,22,35,36,40,42,43,45,48,[51][52][53][54][55][56][57][58][59][60][61][62] and etch-and-fill [8,21,22,35,39,[45][46][47][49][50][51][52][53][54] are described below in 5.4.1.…”

“…The poling voltage is typically 150 VDC/urn. Thus, for this example, the poling voltage required would be 1200 VDC [3,4,7,8,21,22,35,36,[39][40][41][42][48][49][50][51][52][53][54][55][56][57][58][59][60][61][62][63]65]. With the voltage still applied, the circuit is cooled to room temperature.…”

“…This locks the moieties in place. This type of poling is known as selective poling [3,4,8,21,22,36,40,42,43,48,[51][52][53][54][55][56][57][58][59][60][61][62]; only the NLO material under the electrode is poled. Since the regions along the axis parallel to the applied voltage become birefringent, the electric field of a TM mode will see a higher refractive index in the poled regions than in the un-poled regions, becoming wavguides for TM light [61].…”

“…The separation between the electrodes for this example is 8 (im. The thicknesses for the cladding and core layers given above have been determined, by several researchers, to provide low propagation loss and are the thicknesses generally used [3,4,7,8,21,22,36,[39][40][41][42][43][45][46][47][48][49][50][51][52][53][55][56][57][58][59][60][61][62][63]65,68].…”

Study of poling methods for multilayer pyroelectric thin film infrared detectors

“…A DC poling process, as a widely used conventional method, uses a continuous DC voltage applied on two electrodes of a parallel capacitor made by a ferroelectric film at room temperature or elevated temperatures [3][4][5]. On the other hand, a pulse poling process uses a pulse voltage [5][6][7][8].…”