A novel paradigm for the fabrication of highly uniform nanowire arrays using residual stress-induced patterning

Zhao, Zhi; Wang, Nan; Nan, Hanqing; Shen, Li; Durkan, Colm; He, Ximin

doi:10.1039/c6tc01653g

J. Mater. Chem. C

2016

DOI: 10.1039/c6tc01653g

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A novel paradigm for the fabrication of highly uniform nanowire arrays using residual stress-induced patterning

Zhi Zhao

Nan Wang

Hanqing Nan

et al.

Abstract: A residue-free, one-step method for the fabrication of 1-D materials with highly tunable geometric parameters.

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A novel paradigm for the fabrication of highly uniform nanowire arrays using residual stress-induced patterning

Abstract: A residue-free, one-step method for the fabrication of 1-D materials with highly tunable geometric parameters.

Cited by 1 publication

References 52 publications

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