A novel non-chemically amplified resist based on polystyrene-iodonium derivatives for electron beam lithography
Xuewen Cui,
Siliang Zhang,
Xue Cong
et al.
Abstract:To break the resolution limitation of traditional resists, more work is needed on non-chemically amplified resists (non-CARs). Non-CARs based on iodonium salt modified polystyrene (PS-I) were prepared with controllable molecular weight and structure. The properties of the resist can be adjusted by the uploading of iodonium salts on the polymer chain, the materials with a higher proportion of iodonium salts show better lithography performance. By comparing contrast curves and quality of the lithographic pattern… Show more
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