A novel method to fabricate silicon nanoprobe array with ultra-sharp tip on (111) silicon wafer

Zhang, Xiao; Xiao, Yu; Li, Tie; Wang, Yuelin

doi:10.1007/s00542-017-3687-z

Cited by 5 publications

(2 citation statements)

References 13 publications

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“…Wet etching process for Si tips using tetramethylammonium hydroxide (TMAH), KOH, or HF: HNO 3 : CH 3 COOH mixed solutions is simple and low-cost [ 26 , 27 , 28 , 29 , 30 , 31 ]. However, wet etching using TMAH and KOH has a high crystal orientation dependency and requires extremely precise alignment with the mask [ 28 , 29 ]. In the HF: HNO 3 : CH 3 COOH etching method it is difficult to control the process and maintain a stabilized etch rate [ 31 ].…”

Section: Introductionmentioning

confidence: 99%

Batch Fabrication of Silicon Nanometer Tip Using Isotropic Inductively Coupled Plasma Etching

et al. 2020

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This work reports a batch fabrication process for silicon nanometer tip based on isotropic inductively coupled plasma (ICP) etching technology. The silicon tips with nanometer apex and small surface roughness are produced at wafer-level with good etching homogeneity and repeatability. An ICP etching routine is developed to make silicon tips with apex radius less than 5 nm, aspect ratio greater than 5 at a tip height of 200 nm, and tip height more than 10 μm, and high fabrication yield is achieved by mask compensation and precisely controlling lateral etch depth, which is significant for large-scale manufacturing.

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Section: Introductionmentioning

confidence: 99%

Batch Fabrication of Silicon Nanometer Tip Using Isotropic Inductively Coupled Plasma Etching

et al. 2020

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“…The fabrication of sharp tips, made using silicon or made using silicon molds, is investigated extensively for a broad range of applications, such as field emission, atomic force microscopy (AFM), and cell research. (1)(2)(3)(4)(5)(6)(7)(8) For typical applications, a robust tip with a high aspect ratio and a small radius is essential. Molded tips, for example made from silicon nitride, diamond-like carbon (9) or metals, (4) are widely used for a range of applications.…”

Section: Introductionmentioning

confidence: 99%

Ultrasharp High-aspect-ratio Tetrahedral Molded Tips

Vermeer¹,

Berenschot

Sarajlic

et al. 2019

Sensors and Materials

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The fabrication of sharp tips manufactured using silicon or using a silicon mold is a widely used method with a wide range of applications. In this study, we extend our work on the fabrication of tetrahedral molds in (111) silicon and the fabrication of tips based on those molds. We present multiple strategies to make a range of different structures out of silicon-rich nitride, focusing on an approach that takes advantage of oxidation sharpening to improve both the aspect ratio and the tip radius, as well as to make the fabrication process both more efficient and versatile. In this way, single tips and so-called tripod tips with a radius of less than 3 nm are successfully fabricated and used in an AFM probe to show the functionality of the tips.

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Extremely vertical sidewall trench etching on silicon substrate and modelling etching using artificial neural network

Yang¹,

Wang²,

Li³

et al. 2019

Mater. Res. Express

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A novel method to fabricate silicon nanoprobe array with ultra-sharp tip on (111) silicon wafer

Cited by 5 publications

References 13 publications

Batch Fabrication of Silicon Nanometer Tip Using Isotropic Inductively Coupled Plasma Etching

Batch Fabrication of Silicon Nanometer Tip Using Isotropic Inductively Coupled Plasma Etching

Ultrasharp High-aspect-ratio Tetrahedral Molded Tips

Extremely vertical sidewall trench etching on silicon substrate and modelling etching using artificial neural network

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