A Novel Large‐Scale, Multilayer, and Facilely Aligned Micropatterning Technique Based on Flexible and Reusable SU‐8 Shadow Masks

Abstract

A simple method to fabricate flexible, mechanically robust, and reusable SU‐8 shadow masks is demonstrated. This shadow mask technology has high pattern flexibility as various shapes with different dimensions can be created. The fabricated shadow masks are characterized in terms of the resolution, reusability, and capability of multilayer surface micropatterning. Fabrication of a new plastic photomask for the exposure process simplifies the shadow mask fabrication process and results in higher resolution in the shadow mask structures compared to the commercial chromium photomasks. For the multilayer surface micropatterning technology, a simple and fast alignment technique based on SU‐8 pillars and without usage of any microscopic tools is reported. This unique method leads to a less complicated alignment process with the alignment accuracy of ≈2 µm. The proposed shadow mask technology can be easily employed for wafer‐scale micropatterning process. The capability of fabricated SU‐8 shadow masks in micropatterning on polymer thin films is evaluated by fabricating metallic contacts on poly(3,4‐ethylenedioxythiophene) samples and electrical characterization.

High Mass Loading Asymmetric Micro-supercapacitors with Ultrahigh Areal Energy and Power Density

“…To meticulously investigate high mass loading MSCs, devices with interdigitated electrodes were fabricated by a simple photolithography method . Specifically, Cr/Au fingers (thickness of 5 nm/50 nm) as current collectors were subsequently deposited onto silicon wafers by electron beam evaporation (EBV) and patterned by photoresist AZ 5214E (Figure a).…”

P- and N-dopable ambipolar bulk heterojunction thermoelectrics based on ladder-type conjugated polymers

“…One way to overcome the such as thermal evaporation of p-and n-dopants via shadowmasks. Such an approach allows the fabrication of small devices with dimensions down to 10 mm, 16 without the need of micropatterning the p-and n-channel legs separately, while still taking advantage of the solution-processability of the polymer.…”

“…One way to overcome the need to separately print the micron-size p- and n-channel legs using p- and n-type polymers is to use an ambipolar polymer that can be either p- or n-doped to form the respective p- and n-channel legs in selected areas using fabrication techniques such as thermal evaporation of p- and n-dopants via shadow-masks. Such an approach allows the fabrication of small devices with dimensions down to 10 μm, 16 without the need of micropatterning the p- and n-channel legs separately, while still taking advantage of the solution-processability of the polymer.…”

Ultrathin, Flexible, and Reusable Silicon Shadow Masks Manipulated via Transfer Printing

“…jig, built-in cavities or etched pyramids, V-grooves on a target substrate, and SU-8 pillars. [24][25][26][27] However, those approaches require extra structures formed on the target substrate which reduces the substrate material choices and the scalability of stencil lithography process. To overcome these challenges, a novel strategy must be adopted to manipulate a thin shadow mask for the high precision alignment.…”