A novel etch chemistry for low-damage poly-Si gate patterning

Richter, H.; Aminpur, M.-A.; Wolff, A.; Sorge, R.; Rau, W.D.

doi:10.1109/vlsit.1998.689245

1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216)

DOI: 10.1109/vlsit.1998.689245

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A novel etch chemistry for low-damage poly-Si gate patterning

H. Richter

M.-A. Aminpur²,

A. Wolff

et al.

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A novel etch chemistry for low-damage poly-Si gate patterning

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References 3 publications

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