A novel diffractive encoding principle for absolute optical encoders

Hopp, David; Wibbing, Daniel; Pruß, Christof; Binder, J.; Schinköthe, Wolfgang; Sterns, Frank; Seybold, J.; Fritz, Karl-Peter; Mayer, Volker; Heinz, Kuehn

doi:10.1117/12.891800

Cited by 3 publications

(1 citation statement)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…* Author to whom any correspondence should be addressed. controllers [5][6][7], rotary encoders based on novel optical microsystems [8], Bessel beam generation devices [9,10], and interferometric testing of precision cones [11]. The rapid development of industrial production has put forward new requirements for the simple and efficient fabrication of largearea DOEs with rotationally symmetric phase distribution.…”

Section: Introductionmentioning

confidence: 99%

DMD maskless digital lithography based on stepwise rotary stitching

Yuan

liu

Huang

et al. 2023

J. Micromech. Microeng.

View full text Add to dashboard Cite

Diffractive optical elements(DOEs)with rotationally symmetric phase distribution are mainly produced by laser direct writing technique in a polar coordinate system, which has slow processing speed and limited fabrication area. In this paper,we propose a DMD maskless digital lithography technique based on stepwise rotary stitching. DOEs with rotationally symmetric phase distribution are fabricated by exposure of stitching units and rotation of rotary tables. Then, different stitching units are designed to compensate for the errors caused by the accuracy of the rotary table. Finally, the high quality DOEs are produced by the double-exposure method. When increasing the fabrication area, significantly improves the saw-tooth of the lithography pattern edge while reducing misalignment and overlap of stitching caused by residual errors. The diameter of the fabricated Fresnel zone plate was increased from 5.25 mm to 11.40 mm, and the fabrication area was 4.72 times larger than conventional lithography. The stitching error of 18.95 μm has been eliminated after optimization, and the pixelization has been smoothed. The diffraction results show that the method not only can produce large area and high-quality diffraction elements but also greatly reduce the processing cost.

show abstract