2014
DOI: 10.1007/978-81-322-1817-3_33
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A Novel Carbon Nanotube Field Effect Transistor Based Analog Signal Processing Circuits for Low-power Communication Systems

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Cited by 4 publications
(10 citation statements)
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“…e comparative examination of the important parameters of CNFET-FCOA architectures affirms that a noteworthy improvement in performance is achieved in the CNFET-based FCOAs and the gain is highest amongst three for pitch equals to 8 nm. e similar kind of performance is not possible at such 4 Journal of Nanotechnology very deep submicron levels using CMOS due to extreme short-channel effects, lithographic limitations, process variations, leakage current, and source-to-drain tunneling [25,[37][38][39][40][41]. Further CNFET technology can also be easily clubbed with the bulk CMOS technology on a single chip and utilizes the same infrastructure [23,30,42].…”
Section: Optimum Choice For Pitch and Diameter Of Cnfetmentioning
confidence: 99%
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“…e comparative examination of the important parameters of CNFET-FCOA architectures affirms that a noteworthy improvement in performance is achieved in the CNFET-based FCOAs and the gain is highest amongst three for pitch equals to 8 nm. e similar kind of performance is not possible at such 4 Journal of Nanotechnology very deep submicron levels using CMOS due to extreme short-channel effects, lithographic limitations, process variations, leakage current, and source-to-drain tunneling [25,[37][38][39][40][41]. Further CNFET technology can also be easily clubbed with the bulk CMOS technology on a single chip and utilizes the same infrastructure [23,30,42].…”
Section: Optimum Choice For Pitch and Diameter Of Cnfetmentioning
confidence: 99%
“…e op-amp A1 output turns out to be positive only during the positive half cycle of the input waveform. V′ becomes negative which eventually turns ON the diode D1 [41]. e voltage at the inverting terminal of A2 appears at the output, which is equal to the input, due to the virtual ground at the two input terminals of op-amp A2.…”
Section: Journal Of Nanotechnologymentioning
confidence: 99%
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