The kink effect at a very low voltage (∼1.15 V) region is reported in the electrical characteristics of a back-gated thin film transistor fabricated by embedding a TiO 2 (T) layer between two Al 2 O 3 (A) layers grown on a p-Si substrate using electron beam evaporation. A layer of ZnO quantum dots (QDs) deposited on the AT A structure by the sol-gel method is used for charge transportation between the source and drain electrodes grown on the ZnO QDs layer. The effect of TiO 2 is analysed for the charge trapping and possible occurrence of the kink effect.