A Novel Approach to Produce Protein Nanopatterns by Combining Nanoimprint Lithography and Molecular Self-Assembly

Nanoimprint lithography (NIL) is a nonconventional lithographic technique for high‐throughput patterning of polymer nanostructures at great precision and at low costs. Unlike traditional lithographic approaches, which achieve pattern definition through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the resist material and can therefore achieve resolutions beyond the limitations set by light diffraction or beam scattering that are encountered in conventional techniques. This Review covers the basic principles of nanoimprinting, with an emphasis on the requirements on materials for the imprinting mold, surface properties, and resist materials for successful and reliable nanostructure replication.

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“…DNA in nanofluidic channels, [38,39] nanoscale protein patterning, [40,41] the effect of imprinted nanostructures on cell culture [42] ).…”

Section: Introductionmentioning

confidence: 99%

Nanoimprint Lithography: Methods and Material Requirements

2007

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“…[1,2] Several applications in electronics, photonics, magnetic devices, and the biological field have been developed using this simple, low-cost, and high-resolution technique. In the biological field, DNA, [3] proteins, [4][5][6] and guides for molecular motors have been patterned; [7] nanowire arrays have been fabricated for electronic applications; [8] new magnetic devices, such as patterned magnetic media [9,10] and high density quantized magnetic discs, [11] have been engineered; and wire grid polarizers, [12,13] lightemitting diodes, [14,15] and diffractive optical elements [16] have been developed for photonics. The success of NIL as a next generation lithographic technique strongly depends on the research for new materials that are better suited as the nanoimprint resist.…”

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confidence: 99%

High‐Throughput and Etch‐Selective Nanoimprinting and Stamping Based on Fast‐ Thermal‐Curing Poly(dimethylsiloxane)s

et al. 2007

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Nanoimprint lithography (NIL) is a patterning technique that has emerged as one of the most promising technologies for high-throughput nanoscale replication. [1,2] Several applications in electronics, photonics, magnetic devices, and the biological field have been developed using this simple, low-cost, and high-resolution technique. In the biological field, DNA, [3] proteins, [4][5][6] and guides for molecular motors have been patterned; [7] nanowire arrays have been fabricated for electronic applications; [8] new magnetic devices, such as patterned magnetic media [9,10] and high density quantized magnetic discs, [11] have been engineered; and wire grid polarizers, [12,13] lightemitting diodes, [14,15] and diffractive optical elements [16] have been developed for photonics. The success of NIL as a next generation lithographic technique strongly depends on the research for new materials that are better suited as the nanoimprint resist. Because imprint lithography makes a conformal replica of surface relief patterns by mechanical embossing, the resist materials used in imprinting should be deformed easily under an applied pressure. The most commonly used materials in the original NIL scheme are thermal plastic polymers, which become viscous fluids when heated above their glass transition temperatures (T g ). However the viscosity of the heated polymers is typically high and thus the imprinting process requires significant pressure. In addition, these thermal plastic resists normally have a high tendency to stick to the mold because of non-optimized chemistry and orientation of the polymer backbone structures, which seriously affects the fidelity and quality of the pattern definition. Furthermore they do not offer the necessary etch resistance. Therefore, a nanoimprint resist system with combined mold-release and etch-resistance properties that allows fast and precise nanopatterning is highly desirable.Thermally curable monomers are very attractive materials for nanoimprint applications because they present in the liquid state, making it possible for them to be imprinted in a short period of time under low pressure and temperature, in sharp contrast to thermal plastic polymers. As one of these materials, poly(dimethylsiloxane) (PDMS) has previously been used by several research groups for micropatterning, mainly in the context of soft lithography, [17][18][19][20][21] and has found numerous applications in fields as diverse as microelectrochemical systems (MEMS), biotechnology, photonics, and nanoelectronics. In addition to its well known transparency to UV and visible light along with its good biocompatibility, it has a low surface energy (18-21 mN m -1 ) [22] that allows easy mold release without causing any structural damage to the imprinted structures; moreover, it posses a high resistance to oxygen plasma because of a higher silicon content. However, the PDMS material made from commercial Sylgard 184 as precursor is not suitable for nanoimprint applications because of two significant drawbacks. Firstly, its cur...

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“…Using photolithography [4] or electron beam lithography [5], nanopatterning of modified areas can be achieved. These methods are used to modify a solid surface for protein [6] or nucleic acid [7] patterning. However, those methods can be used only to form chemically discrete patterns that are determined by the molecule species.…”

Section: Introductionmentioning

confidence: 99%

Selective Deposition of Lipid Membranes on Locally Anodic-Oxidized Silicon Surface

Nakamura

Isono

Ogino

2011

e-J. Surf. Sci. Nanotechnol.

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We demonstrate control of biomolecule adsorption on Si oxide islands formed by local anodic oxidation using atomic force microscopy. Local anodic oxidation was performed on a thin-SiO2/Si substrate covered with an octadecyltrimethoxysilane (OTMS) film. Dipalmitoylphosphatidylcholine (DPPC) molecules were deposited on the oxide islands. Hydrophilicity of the oxide island surfaces decreased with an increase in the applied voltage. When high voltages were applied, the oxide islands laterally expanded to form round shape and more hydrophilic oxide areas formed in the periphery of the islands. Density of OH groups on the anodic oxide island surface, which determines the surface hydrophilicity, is changed by the applied voltage during the oxidation. Since lipid membrane formation is strongly affected by surface hydrophilicity, selective deposition of DPPC membranes was achieved. We concluded that local anodic oxidation is a useful method for controlling biomolecule adsorption through oxide surfaces with variable hydrophilicity.

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A Novel Approach to Produce Protein Nanopatterns by Combining Nanoimprint Lithography and Molecular Self-Assembly

Cited by 201 publications

References 33 publications

Nanoimprint Lithography: Methods and Material Requirements

Nanoimprint Lithography: Methods and Material Requirements

High‐Throughput and Etch‐Selective Nanoimprinting and Stamping Based on Fast‐ Thermal‐Curing Poly(dimethylsiloxane)s

Selective Deposition of Lipid Membranes on Locally Anodic-Oxidized Silicon Surface

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