A novel approach for process variation detection

Abstract

A novel approach for process variation detection (PVD) is proposed. Named "dynamic measurement", the proposed method is able to detect process corner type. Information on process variability is represented in digital signal (code). Use of such approach can exclude necessity of use of special measurement equipment or embedded test structures (ring oscillators, transistor arrays, etc.) during testing, thereby minimizing process variability evaluation time and cost. The proposed approach can further be improved for more detailed information on process corner/variation. In this paper, metaloxide-semiconductor (MOS) current-voltage characteristics are used to design a circuit based on the proposed approach. With the aid of this approach one can detect not only parameter variations of n or p-type transistors, but also their combinations, resistors, transistors with short channels.