1977
DOI: 10.1016/0036-9748(77)90240-x
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A note ‘on the measurement of intrinsic boundary dislocation spacing from electron micrographs’

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1977
1977
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Cited by 5 publications
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“…the past year have centered on the examination of dislocation structures in both pure and Li doped CoO by TEM, and the effect of both impurity doping and stress level on dislocation spacing. An accurate means of measuring dislocation spacing from TEM thin foils has been developed[14] and this technique has been used to develop quantitative relationships as a function of impurities for Li doped CoO[15]. It has been shown that Li impurity additions increase the dislocation spacing, and reduce the steady state stress exponent, n,from 4.4 to 3.1; independent results obtained both by stress increment tests and by direct TEM examination are in excellent agreement.…”
mentioning
confidence: 99%
“…the past year have centered on the examination of dislocation structures in both pure and Li doped CoO by TEM, and the effect of both impurity doping and stress level on dislocation spacing. An accurate means of measuring dislocation spacing from TEM thin foils has been developed[14] and this technique has been used to develop quantitative relationships as a function of impurities for Li doped CoO[15]. It has been shown that Li impurity additions increase the dislocation spacing, and reduce the steady state stress exponent, n,from 4.4 to 3.1; independent results obtained both by stress increment tests and by direct TEM examination are in excellent agreement.…”
mentioning
confidence: 99%