A Non-Covalent Approach for Depositing Spatially Selective Materials on Surfaces

Chen, Mu‐San; Brandow, Susan L.; Schull, Terence L.; Chrisey, Douglas B.; Dressick, Walter J.

doi:10.1002/adfm.200400615

Cited by 34 publications

(65 citation statements)

References 90 publications

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“…Reduction and immersion in an electroless metallization bath create micropatterns of metal, e.g. nickel, with sharp boundaries on top of the silane layer [180] .…”

Section: Electroless Nano-nickel On Cnt and Sam Layersmentioning

confidence: 99%

Electroless nickel, alloy, composite and nano coatings – A critical review

Sudagar¹,

Lian²,

Sha³

2013

Journal of Alloys and Compounds

769

420

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The development of metal deposition processes based on electroless nickel, alloy and composite coatings on various surfaces has witnessed a surge in interest among researchers, with many recent applications made possible from many excellent properties. In recent years, these coatings have shown promising corrosion and wear resistance properties and large number of newer developments became most important from macro to nano level 1 applications. After a brief review of the fundamental aspects underlying the coating processes, this paper discusses in detail about different electroless nickel alloy, composite, nano plating, bath techniques, preparation, characterization, new depositing mechanism and their recent applications, including brief notes on difficult substrate and waste treatment for green environment. Emphasis will be on to their recent progress, which will be discussed in detail and critically reviewed.

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“…Reduction and immersion in an electroless metallization bath create micropatterns of metal, e.g. nickel, with sharp boundaries on top of the silane layer [180] .…”

Section: Electroless Nano-nickel On Cnt and Sam Layersmentioning

confidence: 99%

Electroless nickel, alloy, composite and nano coatings – A critical review

Sudagar¹,

Lian²,

Sha³

2013

Journal of Alloys and Compounds

769

420

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“…The BiAs-Bi/SiC junction provides a robust platform for QSVHK states, protected by a global gap of 287 meV, which is ∼ 14 times larger than in BLG [20], supporting ballistic transport at high temperatures. Even multiple QSH-QVH boundaries can be flexibly created by spatially-selective deposition [62,63], i.e., by alternating depositing Bi and BiAs arrays on SiC substrate, enabling transport of high-density channels. Unlike in BLG, the QSVHK states in bismuthene-based system are spin polarized and require no external field.…”

mentioning

confidence: 99%

Quantum Spin-Valley Hall Kink States: From Concept to Materials Design

Zhou,

Cheng,

Schleenvoigt

et al. 2021

Preprint

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We propose a general and tunable platform to realize high-density arrays of quantum spin-valley Hall kink (QSVHK) states with spin-valley-momentum locking based on a two-dimensional hexagonal topological insulator. Through the analysis of Berry curvature and topological charge, the QSVHK states are found to be topologically protected by the valley-inversion and time-reversal symmetries. Remarkably, the conductance of QSVHK states remains quantized against either nonmagnetic or long-range magnetic disorder, verified by the Green function calculations. Based on first-principles results, we show that QSVHK states, protected with a gap up to 287 meV, can be realized in bismuthene by alloy engineering, surface functionalization, or electric field, supporting non-volatile applications of spin-valley filters, valves, and waveguides even at room temperature.

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“…Experimental parameters such as the environmental conditions and solvent choice affect the density of organosilane thin films [ 37 – 38 ]. A model was proposed for the self-assembly of CMPS nanostructures formed within areas of nanoholes which subsequently grew to form multiple layers of CMPS through self-polymerization [ 37 , 39 ]. In a recent report, we have shown that changes in the parameters of temperature and solvent affect the growth of CMPS nanostructures prepared within a matrix film of organosilanes prepared with particle lithography [ 40 ].…”

Section: Introductionmentioning

confidence: 99%

Heterostuctures of 4-(chloromethyl)phenyltrichlorosilane and 5,10,15,20-tetra(4-pyridyl)-21H,23H-porphine prepared on Si(111) using particle lithography: Nanoscale characterization of the main steps of nanopatterning

Chambers¹,

Garno²

2018

Beilstein J. Nanotechnol.

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Nanostructures of 4-(chloromethyl)phenyltrichlorosilane (CMPS) were used as a foundation to attach and grow heterostructures of porphyrins and organosilanes. A protocol was developed with particle lithography using steps of immersion in organosilane solutions to selectively passivate the surface of Si(111) with octadecyltrichlorosilane (OTS). A methyl-terminated matrix was chosen to direct the growth of CMPS nanostructures to fill the uncovered sites of Si(111) to enable spatial confinement of the surface reaction. Silica spheres with a diameter of 500 nm were used as a surface mask to prepare nanoscopic holes within the OTS matrix film. Next, the samples were immersed in solutions of CMPS dissolved in toluene or bicyclohexane. Nanostructures of CMPS formed within the nanoholes, to furnish spatially selective sites for binding porphyrins. The samples were then characterized with AFM to evaluate the height and morphology of the CMPS nanostructures that had formed within the nanoholes of OTS. The samples were then refluxed in a porphyrin solution for selective binding to produce heterostructures. The attachment of porphyrins was evidenced by increases in the height and width of the CMPS nanopatterns. The measurements of size indicate that multiple layers of porphyrins were added. Through each step of the surface reaction the surrounding matrix of OTS showed minimal areas of nonspecific adsorption. The AFM studies provide insight into the mechanism of the self-polymerization of CMPS as a platform for constructing porphyrin heterostructures.

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A Non-Covalent Approach for Depositing Spatially Selective Materials on Surfaces

Cited by 34 publications

References 90 publications

Electroless nickel, alloy, composite and nano coatings – A critical review

Electroless nickel, alloy, composite and nano coatings – A critical review

Quantum Spin-Valley Hall Kink States: From Concept to Materials Design

Heterostuctures of 4-(chloromethyl)phenyltrichlorosilane and 5,10,15,20-tetra(4-pyridyl)-21H,23H-porphine prepared on Si(111) using particle lithography: Nanoscale characterization of the main steps of nanopatterning

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