1995
DOI: 10.1109/22.375221
|View full text |Cite
|
Sign up to set email alerts
|

A non-contact interconnection through an electrically thick ground plate common to two microstrip lines

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
5
0

Year Published

1997
1997
2011
2011

Publication Types

Select...
6
2

Relationship

0
8

Authors

Journals

citations
Cited by 20 publications
(5 citation statements)
references
References 5 publications
0
5
0
Order By: Relevance
“…Since both upper and lower shielding would generally be required for each line in a 3D membrane-based MCM, this local variation in ground plane separation would be difficult to achieve using traditional fabrication techniques such as silicon micromachining. This means that their demonstration to date has only involved the coupling of unshielded coplanar lines with a common substrate [27,30], or microstrip lines with a common substrate [30] or ground plane [25,26,28,29,31] (Figure 1(b)), and this has until now The proposed 3D millimeter-wave MCM is similar in concept to that illustrated in Figure 1 but is fully compatible with the micromachined lines demonstrated in [1] and the vias characterized in Sections 3.1 and 3.2. The characterized vertical coupling structures allow the routing of millimeter-wave signals between the adjacent levels of a 3D module created by stacking self-aligning micromachined shielding and membrane layers.…”
Section: Vertical Interconnectsmentioning
confidence: 81%
See 1 more Smart Citation
“…Since both upper and lower shielding would generally be required for each line in a 3D membrane-based MCM, this local variation in ground plane separation would be difficult to achieve using traditional fabrication techniques such as silicon micromachining. This means that their demonstration to date has only involved the coupling of unshielded coplanar lines with a common substrate [27,30], or microstrip lines with a common substrate [30] or ground plane [25,26,28,29,31] (Figure 1(b)), and this has until now The proposed 3D millimeter-wave MCM is similar in concept to that illustrated in Figure 1 but is fully compatible with the micromachined lines demonstrated in [1] and the vias characterized in Sections 3.1 and 3.2. The characterized vertical coupling structures allow the routing of millimeter-wave signals between the adjacent levels of a 3D module created by stacking self-aligning micromachined shielding and membrane layers.…”
Section: Vertical Interconnectsmentioning
confidence: 81%
“…The high-performance vias which have been extensively demonstrated so far fall into two categories: electromagnetically coupled [25][26][27][28][29][30][31] with at best, 0.2 dB insertion loss at W-band [30] for a microstrip type geometry, and direct contact transitions [31][32][33][34][35] with around 0.6 dB insertion loss at 94 GHz [31] for a coplanar line. Both of these have been demonstrated only between lines fabricated on bulk dielectrics.…”
Section: Vertical Interconnectsmentioning
confidence: 99%
“…The model of the latter interaction, including the equivalent circuit representation, was presented in ref. 3. After the equivalent circuit for the NRDW-slot junction is obtained, it is combined with the equivalent circuit for the aperture-loaded microstrip to yield the final circuit model for the NRDW-to-microstrip coupler.…”
Section: Circuit Model and A Computed Examplementioning
confidence: 99%
“…If the wall thickness exceeds this value, a waveguide concept [ 10] has to be introduced. If the wall thickness exceeds this value, a waveguide concept [ 10] has to be introduced.…”
Section: Connection For Dual Polarisation With Finite Thick Wallsmentioning
confidence: 99%