1991
DOI: 10.1007/bf01544025
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A new type of cluster and cluster ion source

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Cited by 140 publications
(94 citation statements)
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“…The silicon clusters in this work were produced by the magnetron gas aggregation method similar to that described by the groups of von Issendorf/Haberland [17,21], Palmer [14] and Milani [15] using a DC sputter head and a gas aggregation chamber manufactured by Oxford Applied Research. The aggregation chamber was cooled with liquid nitrogen.…”
Section: Methodsmentioning
confidence: 99%
“…The silicon clusters in this work were produced by the magnetron gas aggregation method similar to that described by the groups of von Issendorf/Haberland [17,21], Palmer [14] and Milani [15] using a DC sputter head and a gas aggregation chamber manufactured by Oxford Applied Research. The aggregation chamber was cooled with liquid nitrogen.…”
Section: Methodsmentioning
confidence: 99%
“…Briefly, C n N − m anions are produced by reactive sputtering of a graphite target (Kurt J. Lesker) within a magnetron sputter source [30]. Ar-and N 2 -gas are used for the reactive sputtering process which leads to formation of C n N m clusters in different charge states.…”
Section: Experimental and Computational Detailsmentioning
confidence: 99%
“…35 In SCBD, neutral clusters are accelerated in a carrier gas by the supersonic expansion; electrostatically accelerated ion clusters are not used therefore to assemble the nanostructured film. 36 Here, we present the production of cluster-assembled zirconia films with cubic structure at room temperature and with controlled nanoscale morphology. We characterized the effect of thermal annealing in reducing and oxidizing conditions (temperature range: from room temperature to 1000 C) on the crystalline structure, grain dimensions, and topography, highlighting the mechanisms of film growth and phase transition, which determine the observed interfacial morphological properties and their resilience against thermal treatments.…”
Section: Introductionmentioning
confidence: 99%