Abstract:A new temperature compensation concept suitable for rapid thermal processor (RTP) with non-uniform temperature distribution was proposed in this work. Concentric Si rings with different diameters are placed between wafer and planar susceptor and are regarded as a patterned susceptor. By properly arranging the Si rings on the planar quartz or Si susceptor, one can make the semiconductor wafers have more uniform temperature distribution in a non-uniform temperature RTP system. This is a very simple and cheap met… Show more
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