A new nanocomposite resist for low and high voltage electron beam lithography

Ali, Mohammad Azam; Gonsalves, Kenneth E.; Agrawal, Ankur; Jeyakumar, Augustin; Henderson, Clifford L.

doi:10.1016/s0167-9317(03)00363-0

Cited by 18 publications

(6 citation statements)

References 10 publications

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“…Incorporation of methacrylate-functionalized POSS into other acrylate-based polymers has been reported to give high resolution and sensitivity lithography resists ,,,, or devices, dental composite materials with improved mechanical properties, , thermosetting matrices, or fluorinated materials . A POSS−methacrylate polymer has also been used in photosensitive paints as a binder for the luminescent dye, replacing the silica normally used and adding properties such as transparency, permeability to oxygen, and thermal resistance .…”

Section: Applications Of T8 Poss Derivativesmentioning

confidence: 99%

Recent Developments in the Chemistry of Cubic Polyhedral Oligosilsesquioxanes

2010

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Section: Applications Of T8 Poss Derivativesmentioning

confidence: 99%

Recent Developments in the Chemistry of Cubic Polyhedral Oligosilsesquioxanes

2010

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“…For example, NFs with atomic numbers higher than that of the polymer reduce electron scattering during EBL, thus increasing the resolution (Ishii et al, 1997;Hu et al, 2001;Merhari et al, 2002). NFs can also improve the resistance to chemical or plasma etching (Hu et al, 2001;Merhari et al, 2002;Ali et al, 2003) and increase the refractive index of polymer matrices (Bremer et al, 2009;Bae et al, 2010).…”

Section: Nanoparticles As Filler Materialsmentioning

confidence: 99%

“…Carbon NFs increase the electrical and thermal conductivity of the resist (Dawan et al, 2008;Potts et al, 2011;Bai et al, 2012;Majidian et al, 2014) and also find applications in sensing (Xi et al, 2013;Sun et al, 2018). Ceramic NFs may improve the mechanical properties of a composite (Jiguet et al, 2006a;Tjong, 2006;Dusoe et al, 2017), its etching resistance (Hu et al, 2001;Merhari et al, 2002;Ali et al, 2003;Tiwale et al, 2019) and increase its refractive index (Bremer et al, 2009;Bae et al, 2010). Also, NCPRs with piezoelectric NFs are investigated for applications in bio-science (Marino et al, 2015b) or as pressure sensors for robotic manipulation (Zhang et al, 2020).…”

Section: Examples Of Nanocomposite Photoresists and Applicationsmentioning

confidence: 99%

“…A common goal behind the addition of ceramic NFs is to reinforce mechanical properties of a PR (Tjong, 2006). However, the incorporation of ceramic NFs may also lead to an augmentation of the refractive index of polymer matrices (Bremer et al, 2009;Bae et al, 2010) or to enhanced the resistance of NCPRs to chemical or plasma etching (Hu et al, 2001;Merhari et al, 2002;Ali et al, 2003).…”

Section: Ceramic Nanofillersmentioning

confidence: 99%

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Recent Advances on Nanocomposite Resists With Design Functionality for Lithographic Microfabrication

et al. 2021

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Nanocomposites formed by a phase-dispersed nanomaterial and a polymeric host matrix are highly attractive for nano- and micro-fabrication. The combination of nanoscale and bulk materials aims at achieving an effective interplay between extensive and intensive physical properties. Nanofillers display size-dependent effects, paving the way for the design of tunable functional composites. The matrix, on the other hand, can facilitate or even enhance the applicability of nanomaterials by allowing their easy processing for device manufacturing. In this article, we review the field of polymer-based nanocomposites acting as resist materials, i.e. being patternable through radiation-based lithographic methods. A comprehensive explanation of the synthesis of nanofillers, their functionalization and the physicochemical concepts behind the formulation of nanocomposites resists will be given. We will consider nanocomposites containing different types of fillers, such as metallic, magnetic, ceramic, luminescent and carbon-based nanomaterials. We will outline the role of nanofillers in modifying various properties of the polymer matrix, such as the mechanical strength, the refractive index and their performance during lithography. Also, we will discuss the lithographic techniques employed for transferring 2D patterns and 3D shapes with high spatial resolution. The capabilities of nanocomposites to act as structural and functional materials in novel devices and selected applications in photonics, electronics, magnetism and bioscience will be presented. Finally, we will conclude with a discussion of the current trends in this field and perspectives for its development in the near future.

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“…This work has concentrated on the development of a relatively facile approach for the creation of CuO/Poly(methyl methacrylate) (PMMA) nanocomposites as a novel resist material for electron beam lithography (EBL) with the final aim of being employed as the functional material in nanoelectronic devices, such as gas sensors. In most reported works, such as the those of the Gonsalves group since the early 2000s [16][17][18], the incorporation of nanofillers of sizes less than 10 nm inside resist hosts is performed with the aim of improving the resolution without sacrificing the inherent sensitivity and contrast. However, the incentive of the present work is to add functionalities to the resist by the inclusion of CuO nanostructures with typical sizes of 10-30 nm and to explore whether the composite PMMA can still be patterned by EBL and to what extent its properties (resolution, sensitivity) may be affected.…”

Section: Introductionmentioning

confidence: 99%

CuO/PMMA Polymer Nanocomposites as Novel Resist Materials for E-Beam Lithography

et al. 2021

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Polymer nanocomposites have emerged as a new powerful class of materials because of their versatility, adaptability and wide applicability to a variety of fields. In this work, a facile and cost-effective method to develop poly(methyl methacrylate) (PMMA)-based polymer nanocomposites with copper oxide (CuO) nanofillers is presented. The study concentrates on finding an appropriate methodology to realize CuO/PMMA nanocomposites that could be used as resist materials for e-beam lithography (EBL) with the intention of being integrated into nanodevices. The CuO nanofillers were synthesized via a low-cost chemical synthesis, while several loadings, spin coating conditions and two solvents (acetone and methyl ethyl ketone) were explored and assessed with regards to their effect on producing CuO/PMMA nanocomposites. The nanocomposite films were patterned with EBL and contrast curve data and resolution analysis were used to evaluate their performance and suitability as a resist material. Micro-X-ray fluorescence spectroscopy (μ-XRF) complemented with XRF measurements via a handheld instrument (hh-XRF) was additionally employed as an alternative rapid and non-destructive technique in order to investigate the uniform dispersion of the nanofillers within the polymer matrix and to assist in the selection of the optimum preparation conditions. This study revealed that it is possible to produce low-cost CuO/PMMA nanocomposites as a novel resist material without resorting to complicated preparation techniques.

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A new nanocomposite resist for low and high voltage electron beam lithography

Cited by 18 publications

References 10 publications

Recent Developments in the Chemistry of Cubic Polyhedral Oligosilsesquioxanes

Recent Developments in the Chemistry of Cubic Polyhedral Oligosilsesquioxanes

Recent Advances on Nanocomposite Resists With Design Functionality for Lithographic Microfabrication

CuO/PMMA Polymer Nanocomposites as Novel Resist Materials for E-Beam Lithography

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