31st European Solid-State Device Research Conference 2001
DOI: 10.1109/essderc.2001.195260
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A New Model for Threshold Voltage Mismatch Based on the Random Fluctuations of Dopant Number in the MOS Transistor Gate

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Cited by 9 publications
(1 citation statement)
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“…5b which presents the ratio between the standard deviation and the mean value of the mirroring precision for each CM. Independently on the configuration, when the circuits approximate to the weak inversion, the mirroring precision departs from unity due to threshold voltage mismatching, which is predominant in this inversion regime [21], however, when the CMs are biased in strong inversion, all configurations present mirroring precision close to unity and the deviation tends to zero among the different samples of the same circuit. Fig.…”
Section: Mirroring Precisionmentioning
confidence: 99%
“…5b which presents the ratio between the standard deviation and the mean value of the mirroring precision for each CM. Independently on the configuration, when the circuits approximate to the weak inversion, the mirroring precision departs from unity due to threshold voltage mismatching, which is predominant in this inversion regime [21], however, when the CMs are biased in strong inversion, all configurations present mirroring precision close to unity and the deviation tends to zero among the different samples of the same circuit. Fig.…”
Section: Mirroring Precisionmentioning
confidence: 99%