A new measurement method for electrode gain in an orthogonally symmetric beam position monitor

Abstract

The new beam position monitor (BPM) system of the injector at the upgrade project of Hefei Light Source (HLS II) has 19 stripline beam position monitors. Most consist of four orthogonal symmetric stripline electrodes. The differences in electronic gain and mismachining tolerance can cause the change of the beam response of the BPM electrodes. This variation will couple the two measured horizontal positions in order to bring the measuring error. To alleviate this effect, a new technique to measure the relative response of the four electrodes has been developed. It is irrelevant to the beam charge and the related coefficient can be theoretical calculated. The effect of electrodes coupling on this technique is analyzed. The calibration data is used to fit the gain for all 19 injector beam position monitors. The results show the standard deviation of the distribution of measured gains is about 5%.