2005
DOI: 10.1109/led.2004.842437
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A new HCBT with a partially etched collector

Abstract: A novel horizontal current bipolar transistor (HCBT), suitable for the integration with the pillar-like MOSFETs, is processed with the reduced volume of the parasitic regions, achieved by the partial etching of the collector -hill region and the self-protection of the p + extrinsic base from tetramethyl ammonium hydroxide etch-back. The HCBT fabricated by a low-cost technology exhibits the cutoff frequency ( ) of 30.4 GHz, the maximum frequency of oscillations ( max ) of 35 GHz and the collector-emitter breakd… Show more

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Cited by 8 publications
(2 citation statements)
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References 12 publications
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“…At first, the technology concept has been demonstrated by using coarse contact lithography having transistors of with cutoff frequency (f T ) of 4.4 GHz and collector-emitter breakdown voltage (BV CEO ) of 15.8 V [11]. In the second generation of HCBT, the 0.5 μm stepper lithography has been used reaching f T =30.4 GHz and BV CEO =4.2 V which became the fastest lateral bipolar transistor [12,13]. Finally, HCBT has been integrated with CMOS and further optimized having f T =51 GHz and BV CEO =3.4 V [5,14], which is among the fastest pure-silicon bipolar transistors reported [15].…”
Section: Introductionmentioning
confidence: 99%
“…At first, the technology concept has been demonstrated by using coarse contact lithography having transistors of with cutoff frequency (f T ) of 4.4 GHz and collector-emitter breakdown voltage (BV CEO ) of 15.8 V [11]. In the second generation of HCBT, the 0.5 μm stepper lithography has been used reaching f T =30.4 GHz and BV CEO =4.2 V which became the fastest lateral bipolar transistor [12,13]. Finally, HCBT has been integrated with CMOS and further optimized having f T =51 GHz and BV CEO =3.4 V [5,14], which is among the fastest pure-silicon bipolar transistors reported [15].…”
Section: Introductionmentioning
confidence: 99%
“…However, for radio frequency (RF) applications, BJT is still superior to MOSFET for its well-behaved characteristics. Thus, many BJT based novel devices such as SiGe HBT, SiGe BiCMOS [1][2][3], and SOI lateral BJT [8][9][10] have been developed. Nevertheless, these devices suffer also the drawback of complicated fabrication processes, and thus resulting in a high preparing cost.…”
Section: Introductionmentioning
confidence: 99%