A negative ion source test facility

Melanson, Stephane; Dehnel, Morgan; Potkins, David; Theroux, J.; Hollinger, Craig; Martin, J.T.; Philpott, Chris; Stewart, Theodor J.; Jackle, P.; Williams, Peter W.; Brown, Sanborn C.; Jones, Tobin; Coad, Bryan R.; Withington, S.

doi:10.1063/1.4932320

Cited by 2 publications

(1 citation statement)

References 11 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Further planned developments include introducing tantalum into the surfaces of the RADIS plasma chamber and injection of small quantities of xenon gas into the discharge, which has been demonstrated to improve the -H volume production [46]. Recently the RF system developed for the RADIS ion source was coupled with the plasma chamber, magnetic filter and extraction system of the TRIUMF-type (filament) ion source [50] at the ion source test facility (ISTF) operated by D-Pace Inc. [51]. The results of the first experimental campaign are reported in [52] and summarized hereafter.…”

Section: Cw Rf -mentioning

confidence: 99%

Radiofrequency and 2.45 GHz electron cyclotron resonance H⁻volume production ion sources

Tarvainen

Peng

2016

New J. Phys.

View full text Add to dashboard Cite

The volume production of negative hydrogen ions ( -H ) in plasma ion sources is based on dissociative electron attachment (DEA) to rovibrationally excited hydrogen molecules (H 2 ), which is a two-step process requiring both, hot electrons for ionization, and vibrational excitation of the H 2 and cold electrons for the -H formation through DEA. Traditionally -H ion sources relying on the volume production have been tandem-type arc discharge sources equipped with biased filament cathodes sustaining the plasma by thermionic electron emission and with a magnetic filter separating the main discharge from the -H formation volume. The main motivation to develop ion sources based on radiofrequency (RF) or electron cyclotron resonance (ECR) plasma discharges is to eliminate the apparent limitation of the cathode lifetime. In this paper we summarize the principles of -H volume production dictating the ion source design and highlight the differences between the arc discharge and RF/ECR ion sources from both, physics and technology point-of-view. Furthermore, we introduce the state-of-the-art RF and ECR -H volume production ion sources and review the challenges and future prospects of these yet developing technologies. Volume production of -HModern -H plasma ion sources rely on two ion formation processes, resonant-tunneling ionization on low work function surfaces [4] and volumetric ionization occurring in the plasma discharge [5]. Only the volume production will be discussed hereafter.

show abstract

Section: Cw Rf -mentioning

confidence: 99%