Abstract:Conventional spectrophotometric methods were unable to accurately detect urea concentrations below 100 μg/L. A modified spectrophotometric method was developed to determine the trace urea in the ultrapure water (UPW) production process of the semiconductor manufacturing industry. This method was optimized based on the dosage of chemical agents, length of the optical path, and mode of the water bath. Metal ions were added to promote the stability of the chromogenic system. A calibration graph was observed with … Show more
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