2020
DOI: 10.1088/1361-6641/ab6101
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A modified analytical model for AlGaN/GaN FinFETs I V characteristics

Abstract: In this paper, a high electron mobility transistor's (HEMT) analytical model, which is based on the vertical operation of Schottky barrier gate, has been modified for the I−V characteristics of rectangular shaped AlGaN/GaN FinFETs having three-sided Schottky barrier gate operation. The proposed model includes the effect of the tri-gate structure on sheet carrier concentration (n s ) of the device. A three dimensional Poisson equation is solved keeping in view, the device geometry and applied potentials, to get… Show more

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Cited by 4 publications
(3 citation statements)
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“…In the previously published work, analytical model [15,16] and standard drift-diffusion model [6,17] have been applied to study electrical behavior of GaN fin HEMTs. The analytical model enables fast physics-based analysis but can hardly describe complicated 3D device structures.…”
Section: Introductionmentioning
confidence: 99%
“…In the previously published work, analytical model [15,16] and standard drift-diffusion model [6,17] have been applied to study electrical behavior of GaN fin HEMTs. The analytical model enables fast physics-based analysis but can hardly describe complicated 3D device structures.…”
Section: Introductionmentioning
confidence: 99%
“…In Ref. [23], an attempt has been made to present an analytical model for trigate AlGaN/GaN FinFETs which have no oxide layer beneath the gate electrode. Such a device cannot operate at a relatively high forward bias because of high leakage current and, as a result, there is no possibility of inversion layer formation at the oxide-metal interface.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, the model presented in Ref. [23] which involves the 2DEG current alone, can predict I − V characteristics under the depletion mode only, but ceases to work when the device operates in the inversion mode.…”
Section: Introductionmentioning
confidence: 99%