1988
DOI: 10.1557/proc-128-169
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A Model of a Combined Film Deposition and Ion Bombardment for Coatings Formation

Abstract: The mathematical model of a combined film deposition and and high dose ion implantation for coating formation has been developed. Calculations of concentration profiles of implanted element in the film and substrate depending on different parameters of the model have been carried out.

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Cited by 2 publications
(1 citation statement)
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“…A special version of a process involving ion bombardment with simultaneous surface renewal was developed and applied in this work for treatment of both the front and the back surfaces of the FCCs units. The technological specifics of the process are based on a general approach, previously developed, studied, and patented [5][6][7], in combination with the innovative Carbosurf ion-beam treatment of thin space polymer films, described in [2][3][4]. In all experiments, the edges of FCCs were masked by taping them to the surface of a rotating drum with a KaptonHN adhesive tape that covered the external Cu contacts.…”
Section: Ion Beam Surface Treatment Of Fccs For Charge Dissipationmentioning
confidence: 99%
“…A special version of a process involving ion bombardment with simultaneous surface renewal was developed and applied in this work for treatment of both the front and the back surfaces of the FCCs units. The technological specifics of the process are based on a general approach, previously developed, studied, and patented [5][6][7], in combination with the innovative Carbosurf ion-beam treatment of thin space polymer films, described in [2][3][4]. In all experiments, the edges of FCCs were masked by taping them to the surface of a rotating drum with a KaptonHN adhesive tape that covered the external Cu contacts.…”
Section: Ion Beam Surface Treatment Of Fccs For Charge Dissipationmentioning
confidence: 99%