1979
DOI: 10.1016/0039-6028(79)90304-2
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A model for the physical adsorption of atomic hydrogen

Abstract: The formation of the holding potential of physical adsorption is studied with a model in which a hydrogen atom interacts with a perfectly imaging substrate bounded by a sharp planar surface; the exclusion of the atomic electron from the substrate is an important boundary condition in the model. The interaction energy and the dipole and quadrupole moments of the ground state are determined with a variational calculation. The polarizability tensor of the ground state and the interaction energies in the first few… Show more

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Cited by 37 publications
(12 citation statements)
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“…Distances are measured with reference to the first plane of substrate atoms. The comparison with other existing results in the literature [9][10][11]13,54 shows that after adding the image potential term to the calculated HF level shifts, good agreement is Ref. 11.…”
Section: H/al(100)supporting
confidence: 67%
“…Distances are measured with reference to the first plane of substrate atoms. The comparison with other existing results in the literature [9][10][11]13,54 shows that after adding the image potential term to the calculated HF level shifts, good agreement is Ref. 11.…”
Section: H/al(100)supporting
confidence: 67%
“…(5) as well as a smooth switching for large values of z~ and of z2 leading to a free helium atom. We shall see below that the results obtained for the hydrogen atom are in good agreement with those of Bruch et al [9], and this validates our guess for the functional form off(z). The function 0 = (P" f2 obtained is interesting due to its analytical simplicity and because of its simple dependence upon the inter-electronic distance r~.2 through f2 Eq.…”
Section: -Zzsupporting
confidence: 87%
“…2. One can observe that they follow the well known asymptotic behavior: E=-1/4d 3, resulting from coherent dipoledipole interactions, and are in good agreement with those obtained by Bruch et al [9]. This is gratifying since the trial function ~ Eq.…”
Section: Yeaa Relb 421supporting
confidence: 78%
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