2006
DOI: 10.1063/1.2245191
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A model for oxidation kinetics in air at room temperature of hydrogen-terminated (1  ) Si

Abstract: A quantitative model is proposed for the description of the oxidation kinetics in air at room temperature of single crystalline, hydrogen-terminated, (1 0 0) silicon. The theory separates the growth kinetics of the interfacial suboxide from those of the outer stoichiometric oxide. The theory proceeds assuming that the suboxide grows along the surface at the border of oxidized-silicon clusters, while the formation of the stoichiometric oxide takes place on the top of the suboxide at a rate decaying exponentiall… Show more

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Cited by 31 publications
(45 citation statements)
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“…46 The absence of SiO x signals is despite the fact that all of the surface modification steps downstream from SAM-1 are done in the presence of water; even though oxygen has a key role in the oxidation reaction of the surface it is water molecules that are known to catalyze this reaction. 47 This is a very encouraging result for future applications of these surfaces. Fig.…”
Section: Redox Constructs Incorporating Amide Links (Sam-5a)mentioning
confidence: 59%
“…46 The absence of SiO x signals is despite the fact that all of the surface modification steps downstream from SAM-1 are done in the presence of water; even though oxygen has a key role in the oxidation reaction of the surface it is water molecules that are known to catalyze this reaction. 47 This is a very encouraging result for future applications of these surfaces. Fig.…”
Section: Redox Constructs Incorporating Amide Links (Sam-5a)mentioning
confidence: 59%
“…This is followed by electron transfer from the broken bond to an adsorbed O 2 molecule, which drifts toward the cleaved bond, leading to the oxidation of this bond and of a neighboring Si-Si bond. 45 The sequence of steps involved in the ambient-air oxidation of Si-NCs can be seen in reference [25]. The steps prior to the formation of Si-O-Si take place during the induction period and a larger amount of surface Si-OH groups results in a shorter t m .…”
Section: 29mentioning
confidence: 99%
“…For ambient-air oxidation of bulk-Si surfaces, values ranging from 3 to 170 h have been found, depending on the Si surface index, air humidity, and the initial amount of residual Si-OH groups at the surface. [37][38][39][40][41] According to the Cabrera-Mott mechanism of ambient-air oxidation of bulk-Si and Si-NC surfaces, 20,33,45 the oxidation is initiated by adsorption of water molecules at surface Si-OH groups followed by cleavage of Si-Si backbonds of Si-OH. This is followed by electron transfer from the broken bond to an adsorbed O 2 molecule, which drifts toward the cleaved bond, leading to the oxidation of this bond and of a neighboring Si-Si bond.…”
Section: 29mentioning
confidence: 99%
“…5,19 This is the mechanism considered earlier in the description of the ambient air oxidation of bulk-Si surfaces, i.e. in the simultaneous presence of water and oxygen molecules, 55 and is schematically represented in Fig. 6.…”
Section: 54mentioning
confidence: 99%
“…After this, an electron is transferred from the broken bond to an adsorbed O 2 molecule (step 3) and the resulting electrostatic potential forces the O − 2 to drift towards the cleaved Si-Si bond (step 4), leading to the oxidation of this bond and of a neighboring Si-Si bond (step 5). 55 The latter step involves initially the formation of a disilperoxo bridge Si-O-O-Si, which is subsequently transformed in the two Si-O-Si groups via the Bartlett's butterfly mechanism. 55 Within the mechanism represented in Fig.…”
Section: 54mentioning
confidence: 99%