“…High-aspect-ratio materials can be easily obtained on the microscale even if DXRL potential application can be extended to a submicrometer scale (Ehrfeld et al, 1999;Meyer et al, 2008). Another advantage of DXRL is that the lithography is not limited to two-dimensional structures, but complex three-dimensional shape materials (Katoh et al, 2001) such as optical components, micromechanical devices (Chung et al, 2000) and photonic crystals (Feiertag et al, 1997;Katsarakis et al, 2002) can also be fabricated. We have already demonstrated that the effect of hard X-rays on coating layers can be used to produce patterns in mesoporous (Falcaro et al, 2008(Falcaro et al, , 2009a, sol-gel (Falcaro et al, 2009b;, PE-CVD (Costacurta et al, 2010) and soft matter films (Innocenzi et al, 2010) and to generate in situ metallic nanoparticles in patterned structures.…”