1998
DOI: 10.1016/s0257-8972(97)00530-6
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A method for determination of the effective diffusion coefficient and sputtering rate during plasma diffusion treatment

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Cited by 28 publications
(7 citation statements)
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“…Fig. 1 shows that nitriding at lower temperature of 450 o C increases the maximum hardness 1270 H v which is the same as obtained after nitriding at elevated temperatures as shown by others workers [16,17] and also as shown in in the present study at 550 o C.…”
Section: Microhardnss Measurementssupporting
confidence: 90%
“…Fig. 1 shows that nitriding at lower temperature of 450 o C increases the maximum hardness 1270 H v which is the same as obtained after nitriding at elevated temperatures as shown by others workers [16,17] and also as shown in in the present study at 550 o C.…”
Section: Microhardnss Measurementssupporting
confidence: 90%
“…However, it is this passive oxide film that could retard or even stop the absorption and diffusion of C or N during thermochemical treatments of these passive alloys. 113 Owing to their beneficial sputtering and depassivation effect together with their environmental friendliness, 114 plasma processes become the first choice for the generation of S N in austenitic stainless steels by PN in the mid-1980s. 8,10,115 Since then, many investigations have been conducted to study various aspects of LTPN of austenitic stainless steels.…”
Section: Plasma Processesmentioning
confidence: 99%
“…Thus nitriding for 5 h results in a layer of 8.10 mm thinner than that obtained using the cathodic cage technique. For temperatures of 723 K and 873 K the sputtering rate from the sample is 3.0 mm/h [11], so that on nitriding for 5 h the thickness difference is 15.0 mm.…”
Section: Resultsmentioning
confidence: 99%