A MEMS nanoplotter with high-density parallel dip-pen nanolithography probe arrays

Abstract

We report on the development of a nanoplotter that consists of an array of microfabricated probes for parallel dip-pen nanolithography. Two types of device have been developed by using microelectromechanical systems micromachining technology. The first consists of 32 silicon nitride cantilevers separated by 100 µm, while the second consists of eight boron-doped silicon tips separated by 310 µm. The former offers writing and imaging capabilities, but is challenged with respect to tip sharpness. The latter offers smaller linewidths and increased imaging capabilities at the expense of probe density. Parallel generation of nanoscopic monolayer patterns with a minimum linewidth of 60 nm has been demonstrated using an eight-pen microfabricated probe array.

Development of Parallel Dip Pen Nanolithography Probe Arrays for High Throughput Nanolithography

“…The fabrication of these devices has been previously described [14] and is summarized here. The probe tips are first formed by anisotropicly etching the surface of a <100> silicon wafer, followed by oxidation sharpening [15].…”

“…Surface binding in the these demonstrations ranges from strong covalent bonds, as in the thiol-gold [I] and silane-oxide [9] systems, to weaker electrostatic, van der Waals, hydrophobic, and hydrogen bonds [ 10]. In some cases, the covalent chemistries have been shown strong enough to act as masks in various substrate etching applications [11,14].…”

Direct Delivery and Submicrometer Patterning of DNA by a Nanofountain Probe

“…In this context, it is worth mentioning that parallel operation of scanning probes has been pursued in an effort to improve the low throughput of single-tip scanning systems. [26][27][28] In the DPN technique, the throughput limitation was improved using custom-made linear arrays of up to 250 tips [29a] and more recently through the development of 2D 55000-pen arrays.…”

Programmable Technologies for Micro- and Nano-Scale Pattern and Material Transfer and Possible Applications for Control of Self-Assembly

“…Left: Photograph of 50 piezoelectrically-actuated and piezoresistivally-sensed proximal probes for lithography, and an enlargement of five of them [15]. Center: A 32 probe array (top) and an eight probe array for dip pen lithography [16]. Right: Optical micrograph of some of the 1024 proximal probes in the "Millipede" data storage technology being developed by IBM [17].…”